The Tritan HV90 dual-lane metallization firing system features increased throughput at 3600 wafers per hour, an edge belt, volatile organic compound (VOC) abatement and a single zone spike with less than 3 seconds spike time.
The Tritan metallization firing system features BTU?s unique TriSpeed technology, allowing users to take advantage of superior ramp rates ? up to 200ºC per second ? while not compromising the drying and cooling sections of the profile. The three-belt, three-speed system provides revolutionary control of profile development. In trials, Tritan has consistently shown an improvement in fill factor resulting in increased efficiency. This, combined with TRITAN?s low cost of ownership, enables customers to achieve the lowest cost per watt.
To learn more about the Tritan HV90, see us at PV Taiwan, booth1305, October 5-7, Taipei World Trade Center, Taipei, Taiwan.